Dry Etching

ImageManufacturerModelDescriptionQty
OXFORDPlasmalab 133 RIE (CL)GaN Etch, Batch System, 330mm platen, water cooled electrode 10C-80C, 600W RF 13.56MHz1
OXFORDPlasmalab 133 RIE (CL)GaN Etch, Batch System, 330mm platen, water cooled electrode 10C-80C, 600W RF 13.56MHz1
OXFORDPlasmalab 133 RIE (FL)SiO2 Etch, Batch System, 330mm platen, water cooled electrode 10C-80C, 600W RF 13.56MHz1
OXFORDPlasmalab 133 RIE (FL)SiO2 Etch, Batch System, 330mm platen, water cooled electrode 10C-80C, 600W RF 13.56MHz1