ROTH & ROU MicroSys PECVD For Sale
| Model Year: | 2000 |
| Quantity: | 1 |
| Condition: | Excellent operational condition |
| Serial No: | Available upon request |
| Availability: | SOLD |
Configuration:
Vontage: 2000
6ea x 2" wafers on tray (see pictures)
Configured for PECVD and RIE processes
High Density Plasma ICP source
Gases: SiH4, BCl3, Ar, He, N2, Cl2, N2O, NH3, O2
Comments:
The tool is installed in cleanroom. Available for inspection.
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