FEI 830 DualBeam FIB For Sale

Model Year:	1998
Quantity:	1
Condition:	Good operational condition
Serial No:	Available upon request
Availability:	SOLD

Configuration:

Electron Beam Column:
•Schottky Field Emission Gun
•0-30kV Accelerating Voltage
•3nm @1kV Resolution

Ion Beam Column:
•Ga LMIS Ion Source
•30kV Accelerating Voltage
•7nm @30kV Resolution, 22nA

Specimen Stage:
•200mm 5 axis motorized, computerized eucentric tilt stage
•200mm load lock for wafers and pieces

Detectors:
In-lens SEC + BSE (elecrton beam)
CDEM (ion beam)

User Interface:
PC with Windows NT operating system

Gas:
• Metal Etch Gas Injection System (GIS controller, cabling, air hose in place; GSI canister, flled EE crucibleand needle not included. Estimated additional cost is $7K)
• Metal Deposition Gas Injection System

Vacuum System:
•Ion Pumps for Column
•Turbo pump for Chamber
•Mechanical roughing pump

Comments:

The DualBeam XL830 FIB/SEM workstation`s SEM column provides 3-nm resolution from 1-30 kV. The electron column offers balanced-field, in-lens detection to give good topographical detail, down-hole visibility, and enhanced grain boundary imaging. Rapid FIB milling for cross-sectioning, and imaging with the SEM at very high resolution are completely simultaneous operations. The Predictive User Interface keeps the sub-um defect in the field of view during various operations and while viewing from various angles. The operator can switch directly between field-free mode (providing large-area, low-magnification images with low distortion levels and large depth of field) and the immersion mode, for the highest resolution imaging of sub-0.25um features and defects.

This instrument can be purchased in complete but as-is condition or we can provide it in fully refurbished condition with installation, training and support.

Please contact us for price quote if you are interested in considering this instrument for purchase.